Stanford
nano@stanford

Advanced Lithography Symposium

Stanford University
nano@stanford
GenISys
Heidelberg Instruments
Micro Resist Technology
Notion Systems
Scrona

Event Details:

Tuesday, October 24, 2023
9:00am - 3:30pm PDT

Location

Stanford University
420 Via Palou
AllenX 101 Auditorium
Stanford, CA 94035
United States

This event is open to:

Alumni/Friends
Faculty/Staff
General Public
Members
Students

Symposium Agenda

To register: https://bit.ly/nnci-DirectWrite2023

TIMETITLESPEAKERAFFILIATION
9:00Welcome & introductionsTBASNF
9:10NNCI IntroDr. Sara Ostrowskinano@stanford
9:30Versatility of Hybrid Polymers – processing & dimensional capabilitiesDr. Maria RussewMicro Resist technology
9:50Top-down FIB with multiple ions on a lithography platformTorsten RichterRaith America
10:10TBDJona EngelNanoscribe
10:30Coffee break  
10:50Fabricating Flat Lenses by Refractive Index ModificationRoger McCayGenisys
11:10TBDTBDHeidelberg Insruments
11:30Direct Write Atomic Layer Deposition – A New Nanofabrication ToolDr. Michael FeserAtlant 3d
11:50TBDDr. Patrick GallikerSCRONA/ Notion Systems
12:10Lunch break (provided)  
13:00TBDDr. Juliane DosterOsiris GmbH
13:20Wafer-scale Metrology and EBL Process ControlSean Branagan (Applications Engineer for Industrial Lithography), Raith AmericaRaith America
13:40From thin to thick resists – Application examples for the maskless aligner MLA 150Dr. Christian PiesHeidelberg Instruments 
14:00Coffee break  
14:20TBDJona EngelNanoscribe
14:40Life’s Hard, Simplify your SEM MeasurementsDr. Marvin ZaiGenisys
15:00Conclusion   

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