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Advanced Lithography Symposium
Stanford University
nano@stanford
GenISys
Heidelberg Instruments
Micro Resist Technology
Notion Systems
Scrona
Event Details:
Tuesday, October 24, 2023
9:00am - 3:30pm PDT
Location
Stanford University
420 Via Palou
AllenX 101 Auditorium
Stanford, CA 94035
United States
This event is open to:
Alumni/Friends
Faculty/Staff
General Public
Members
Students
Symposium Agenda
To register: https://bit.ly/nnci-DirectWrite2023
| TIME | TITLE | SPEAKER | AFFILIATION |
| 9:00 | Welcome & introductions | TBA | SNF |
| 9:10 | NNCI Intro | Dr. Sara Ostrowski | nano@stanford |
| 9:30 | Versatility of Hybrid Polymers – processing & dimensional capabilities | Dr. Maria Russew | Micro Resist technology |
| 9:50 | Top-down FIB with multiple ions on a lithography platform | Torsten Richter | Raith America |
| 10:10 | TBD | Jona Engel | Nanoscribe |
| 10:30 | Coffee break | ||
| 10:50 | Fabricating Flat Lenses by Refractive Index Modification | Roger McCay | Genisys |
| 11:10 | TBD | TBD | Heidelberg Insruments |
| 11:30 | Direct Write Atomic Layer Deposition – A New Nanofabrication Tool | Dr. Michael Feser | Atlant 3d |
| 11:50 | TBD | Dr. Patrick Galliker | SCRONA/ Notion Systems |
| 12:10 | Lunch break (provided) | ||
| 13:00 | TBD | Dr. Juliane Doster | Osiris GmbH |
| 13:20 | Wafer-scale Metrology and EBL Process Control | Sean Branagan (Applications Engineer for Industrial Lithography), Raith America | Raith America |
| 13:40 | From thin to thick resists – Application examples for the maskless aligner MLA 150 | Dr. Christian Pies | Heidelberg Instruments |
| 14:00 | Coffee break | ||
| 14:20 | TBD | Jona Engel | Nanoscribe |
| 14:40 | Life’s Hard, Simplify your SEM Measurements | Dr. Marvin Zai | Genisys |
| 15:00 | Conclusion |
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