Plasma Science & Technology Seminar Series with Michael Purvis

Abstract:

An innovation leader in the semiconductor industry, ASML has been making giant leaps to solve some of society's toughest challenges since 1984. In our technology, hardware meets software to create innovative lithographic systems for the mass production of microchips, the foundation of the digital world. At ASML San Diego, we develop plasma emitting light sources (λ=13.5 nm) for the next-generation lithography systems. These sources are used to print billions of transistors on silicon wafers at the nanometer scale. In this talk, we will explore how an EUV light source is produced, starting with the physics and principles of light generation that drive the architecture of the EUV source. We’ll also talk about the people that make this possible – a diverse team of tech experts in optics and physics, mathematics and data science, computer science and software engineering, electrical engineering, mechanics and mechatronics. Our Research & Development teams collaborate with a wide network of external partners - from top universities to national labs and world-renowned research institutes - to develop new systems or improve our existing ones. You’ll discover more about the opportunities for collaborations and the innovation areas of ASML San Diego. Whether it’s for an internship, a capstone project, a PhD or a PostDoc, by teaming up with us you’ll work at the cutting edge of tech and you’ll always have new challenges and new problems to solve. Our industry ecosystem is constantly evolving and innovating. Will you too?

Speaker Bio:

Michael Purvis serves as a Sr. Technology Manager for the EUV Source Technology Development Team in ASML San Diego, CA. Dr. Purvis received his Ph.D. degree in Electrical and Computer Engineering from Colorado State University. His thesis work was performed at the National Science Foundation Engineering Research Center for Extreme Ultraviolet Light. Michael has published numerous times in the field of laser created plasmas. His initial investigations at Colorado State University included developing discharge and laser produced EUV lasers for applications in plasma diagnostics; subsequent to this he worked on theoretical plasma modeling and high energy density plasma experiments at CSU, Lawrence Livermore National Labs and SLAC. Michael is currently applying his experience with laser produced plasma towards the development of EUV light sources at ASML. His work at ASML is focused on scaling EUV power output to meet future semiconductor industry performance targets for high volume manufacturing.