Anja Voigt received her diploma and her PhD in Photochemisty at the Humboldt-Universität zu Berlin in 1993, and 1998, respectively. Since 1993 she has been a scientific co-worker with micro resist technology GmbH, and has been responsible for R&D and production of negative photoresists. She has been the product manager for negative photoresists since 2005, and the business unit manager for photo resists since 2012. In this current role, she is responsible for the development of new materials and their presentation at scientific conferences, the acquisition and organization of new projects and partnerships, and the support of high-tech market customers, their needs and requirements.
Roger McCay is the North America Sales Director for GenISys. Roger has been involved in E-beam Lithography technology for over 35 years starting with supporting e-beam systems from various manufacturers, with the past 8 years at GenISys.
Dr. Solak has over twenty years of experience in the fields of micro and nano fabrication and x-ray science. He received his Ph.D. from the Electrical and Computer Engineering Dept. of the University of Wisconsin-Madison. After a postdoctoral appointment at the same university he joined the Paul Scherrer Institute in 2001. He set up and managed world’s first EUV-IL systems at the UW-Madison and later at the PSI. He has been leading development of new lithography methods and tools at Eulitha AG. Dr. Solak has more than one hundred technical articles published in the fields of nanolithography, x-ray microscopy and semiconductor device reliability
Dr Nils Goedecke
Dr. Li Wang received his Ph.D. degree from School of Engineering, Ecole Polytechnique Fédérale de Lausanne (EPFL), and Swiss Center for Electronics and Microtechnology (CSEM SA), Switzerland in early 2011. After a two years postdoctoral research in EUV-IL at Paul Scherrer Institute, he joined EULITHA AG as a R&D engineer responsible for process development and production. He has published extensive papers in Nano Letters, ACS nano, APL, Nanotechnology. etc, . His current interest focuses on micro- and nanofabrication, UV and deep-UV lithography and process development, as well as nano-optics.