Winter Closure
Stanford institutes an annual winter close, in which university ceases administrative operations for about two weeks. The winter close for 2026 formally begins Monday, Dec. 21, 2026 and ends on Friday, Jan. 1, 2027. Schedules for labs are yet to be finalized, but not likely to be too different from last year's. The schedule for 2025 is show below for reference.
2025 Allen Cleanroom Winter Closure Dates
Training Paused for Nemo migration: Friday, Dec. 5, 2025 5:00PM
Closed to users: Friday, Dec. 19, 2025 7:00AM
Reopening to users: Tuesday, Jan. 6, 2026 7:00AM
2025 Spilker Cleanrooms Winter Closure Dates
Training Paused for Nemo migration: Friday, Dec. 5, 2025 5:00PM
Closed to users: Thursday, Dec. 18, 2025 6:00AM
Reopening to users: Tuesday, Jan. 6, 2026 8:00AM
2025 Shriram, Spilker, Moore, McCullough
Winter Closure Dates
Closed to users: Friday, Dec. 19, 2025 5:00PM
Reopening to users: Monday, Jan. 5, 2026 9:00AM
See Table below for details of specific equipment status during shutdown
Winter Closure
The following briefly describes what to expect for nano@stanford equipment during winter closure. If needed, staff will provide further updates through user mailing lists.
Table Notes:
1 | Complete shutdown of all administrative functions during winter closure (account requests, card key access, PTA updates). Expect slower processing times after the break.
2 | Instrument available to fully trained and qualified users who have gained independent after-hour access; no staff support or training during the winter break; card key authorization required for building and lab entry.
3 | Usage by pre-approved users only. Contact staff for details. No staff support or training during the winter break; card key authorization required for building and lab entry.
4 | Complete shutdown. No access permitted.
Cleanrooms - Allen, Spilker
All cleanrooms will be closed during the winter closure during the dates posted above. Note 4.
Instruments - Spilker, Shriram, McCullough
| Instrument | Core | Location | Table Note |
|---|---|---|---|
| Administration | Administration | 1 | |
| SEM: TFS Apreo | Electron & Ion Microscopy | Spilker | 2 |
| SEM: FEI Magellan | Electron & Ion Microscopy | Spilker | 2 |
| SEM: Hitachi TM4000+ | Electron & Ion Microscopy | McCullough | 2 |
| SEM: Ion Mill | Electron & Ion Microscopy | Spilker | 2 |
| SEM/FIB: FEI Helios 600i | Electron & Ion Microscopy | Spilker | 2 |
| SEM/FIB: TFS Hydra PFIB | Electron & Ion Microscopy | Spilker | 2 |
| TEM: TFS Spectra | Electron & Ion Microscopy | Spilker | 4 |
| TEM: FEI Tecnai | Electron & Ion Microscopy | Spilker | 2 |
| TEM: FEI Titan | Electron & Ion Microscopy | Spilker | 2 |
| XRD: PANalytical Empyrean | X-ray & Surface Analysis | McCullough | 2 |
| XRD: PANalytical Empyrean 2 | X-ray & Surface Analysis | McCullough | 2 |
| XRD: PANalytical X'Pert 2 | X-ray & Surface Analysis | McCullough | 2 |
| XRD: Multiwire Laue | X-ray & Surface Analysis | McCullough | 2 |
| XRD: Bruker Single Crystal D8 Venture | X-ray & Surface Analysis | McCullough | 2 |
| XCT: Zeiss Xradia 520 Versa X-ray CT | X-ray & Surface Analysis | McCullough | 2 |
| Auger: PHI 700 | X-ray & Surface Analysis | McCullough | 2 |
| XPS: PHI VersaProbe 3 | X-ray & Surface Analysis | McCullough | 2 |
| XPS: PHI VersaProbe 4 | X-ray & Surface Analysis | McCullough | 2 |
| PESA: Riken AC-2 Photoelectron Spectrometer | X-ray & Surface Analysis | McCullough | 2 |
| SIMS: Cameca NanoSIMS 50l | X-ray & Surface Analysis | Spilker | 3 |
| SPM: Park FX-40 | X-ray & Surface Analysis | McCullough | 2 |
| SPM: Park NX-10 | X-ray & Surface Analysis | McCullough | 2 |
| SPM: Bruker Dimension Icon | X-ray & Surface Analysis | Shriram | 2 |
| SPM: Bruker Dimension IconIR | X-ray & Surface Analysis | Shriram | 2 |
| SPM: Asylum MFP3D AFM | Allen Ex Fab | Allen | 4 |
| Horiba XploRA+ Raman | X-ray & Surface Analysis | McCullough | 2 |
| Horiba Labram Raman | X-ray & Surface Analysis | McCullough | 2 |
| Westbond Wire Bonder | Nanofabrication | McCullough | 2 |
| 3D Printer | Nanofabrication | Moore | 2 |
| Contact Angle Goniometer: Rame-Hart 290 | Soft & Hybrid Materials | Shriram | 2 |
| DLS: Brookhaven instrument Nanobrook Omni | Soft & Hybrid Materials | Shriram | 2 |
| DMA: TA Instrument Q800 | Soft & Hybrid Materials | Shriram | 2 |
| DSC: TA Instrument Q2500 | Soft & Hybrid Materials | Shriram | 2 |
| Ellipsometer: Horiba UVISEL | Soft & Hybrid Materials | Shriram | 2 |
| RT-GPC: Tosoh Room-temperature EcoSEC | Soft & Hybrid Materials | Shriram | 2 |
| HT-GPC: Tosoh High-temperature EcoSEC | Soft & Hybrid Materials | Shriram | 2 |
| HT-TGA/DSC: TA Instrument SDT 650 | Soft & Hybrid Materials | Shriram | 2 |
| LB Trough: Biolin Scientific KSV 5000 | Soft & Hybrid Materials | Shriram | 2 |
| Mechanical Testing: Instron 5565 | Soft & Hybrid Materials | Shriram | 2 |
| Microscopy: Nikon LV100 | Soft & Hybrid Materials | Shriram | 2 |
| Oxygen Plasma Cleaner: Diener Pico | Soft & Hybrid Materials | Shriram | 2 |
| Particle Analysis: NovaTouch | Soft & Hybrid Materials | Shriram | 2 |
| Particle Analysis: Autosorb iQ3 | Soft & Hybrid Materials | Shriram | 2 |
| Particle Analysis: Poremaster 33 | Soft & Hybrid Materials | Shriram | 2 |
| Profilometer: Bruker Dektak XT-A | Soft & Hybrid Materials | Shriram | 2 |
| Rheometer: TA Instrument ARES-G2 | Soft & Hybrid Materials | Shriram | 2 |
| Rheometer-DMA: TA Instrument ARES-G2 | Soft & Hybrid Materials | Shriram | 2 |
| Rheosense | Soft & Hybrid Materials | Shriram | 2 |
| Rheosense mVROC Small-Volume Viscometer | Soft & Hybrid Materials | Shriram | 2 |
| Spectroscopy: Agilent Cary 6000i UV/Vis/NIR | Soft & Hybrid Materials | Shriram | 2 |
| Spectroscopy: Horiba FluoroLog Fluorimeter | Soft & Hybrid Materials | Shriram | 2 |
| Spectroscopy: Nicolet iS50 FT/IR Spectrometer | Soft & Hybrid Materials | Shriram | 2 |
| TGA: TA Instrument Q5500 | Soft & Hybrid Materials | Shriram | 2 |
| Instrument | Core | Location | Note |
|---|---|---|---|
| EBL: Raith EBPG 5200+ | Nanofabrication | Spilker | 4 |
| SEM: FEI Nova SEM | Nanofabrication | Spilker | 4 |
| Litho: ML3 Direct Write (365 nm) | Nanofabrication | Spilker | 4 |
| Litho: ML3 Direct Write (385 nm) | Nanofabrication | Spilker | 4 |
| Deposition: KJL Evaporator 1 and 2 | Nanofabrication | Spilker | 4 |
| Deposition: Cressington Sputter Coater | Nanofabrication | Spilker | 4 |
| Deposition: Oerlikon Univex Sputter | Nanofabrication | Spilker | 4 |
| Etch: Oxford PlasmaPro 80 RIE | Nanofabrication | Spilker | 4 |
| Etch: Intlvac Ion Mill | Nanofabrication | Spilker | 4 |
| Film Thickness: Film Sense FS-1 | Nanofabrication | Spilker | 4 |
| Film Thickness: Filmetrics F40 | Nanofabrication | Spilker | 4 |
| Profilometer: Dektak XT-S Stylus Profiler | Nanofabrication | Spilker | 4 |
| Profilometer: KLA Tencor Alpha Step D-500 | Nanofabrication | Spilker | 4 |
| Microscopy: Keyence VK-X 3D Laser Confocal | Nanofabrication | Spilker | 4 |
| Microscopy: Nikon LV100ND | Nanofabrication | Spilker | 4 |
| Asher: March Instruments PX-250 Plasma Asher | Nanofabrication | Spilker | 4 |
| UV: American Ultraviolet Cool Cure UV Exposure Chamber | Nanofabrication | Spilker | 4 |
| Oven: VST High Vacuum Oven | Nanofabrication | Spilker | 4 |
| Nanopatterning Cleanroom | Nanofabrication | Spilker | 4 |
| Flexible Cleanroom | Nanofabrication | Spilker | 4 |
| Microfab Shop | Nanofabrication | Spilker | 4 |