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Atomic Layer Deposition

Alex Denton

ORCID ID: 0009-0001-5382-9483

Alex Denton is a technical manager with a background in chemistry and materials engineering. After earning a B.A. in Chemistry and an M.S. in Materials Engineering from the University of Colorado Boulder, he led operations at CU Boulder’s COSINC-FAB facility before joining Stanford University. At Stanford, he manages a suite of thin-film and metrology tools, including atomic layer deposition (ALD) systems, ellipsometers, and rapid thermal processing tools. In addition to technical responsibilities, Alex oversees a robust intern program that mentors over 15 students from Bay Area community colleges. In addition to lab responsibilities, Alex likes to play with data, microcontrollers, AI, fast motorcycles, and old cars.

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