SNF Equipment
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- Wafer preparation before resist
- Resist coat
- Resist Bake
- Exposure
- e-Beam Direct Write in NPC
- Ion Beam Direct Write in NPC
- UV Contact Aligner (Masks Required)
- UV Laser Direct Write
- UV Stepper (Masks Required)
- Resist Develop
- Electrical Characterization
- Hall measurement
- Minority Carrier Characterization
- Sheet Resistance Measurement
- Probe Stations: Also one in Flex
- Coming soon: Deep Lab PPMS MPMS
- Optical Measurements
- Ellipsometry for film thickness and optical constants
- Optical Film Stress Measurement
- Reflectometry (film thickness)
- Optical Profilometer/Interferometer
- Surface Analysis