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Diffractive Optical Lens made on the Raith Voyager
NNCI and nano@stanford present:

The Advanced Lithography UnSymposium

8:50 am - noon, PST
Jan. 21/22, 2021

Agenda

Main content start

Day 1, Thur. Jan 21, 8:50-Noon and on <PDF>

Time Title Speaker
8:50-9 Welcome and intro Mary Tang, Stanford
9-9:20 Two-photon grayscale lithography Michael Higdon, Nanoscribe Gmbh
9:20-9:40 Universal Ion Sources for FIB nanopatterning on a lithography platform  Torsten Richter, Raith Gmbh
9:40-10 The MLS300: Making a case for a Maskless Stepper Alternative Sven Preuss, Heidelberg Instruments
10-10:05 Effect of Developer Temperature on Resist Contrast Dale Farnan, UPenn
10:05–10:15 Coffee Break All
10:15-10:35 Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part I) Anja Voigt, Micro Resist Technology
10:35–10:55 Patterning for Photonics with Displacement Talbot Lithography Harun Solak, Eulitha
10:55– 11 Piece Work on the PAS 5500 Garry Bordonaro, Cornell Nanofabrication Facility
11– 11:10 Coffee Break All
11:10- 11:30 NanoFrazor thermal scanning probe lithography Nils Goedecke, Heidelberg Nano
11:30- 11:50 Electron Beam Lithography Software for Enabling Quantum Devices Roger McCay, GenIsys
11:50– 11:55 Ion Beam Patterning for Self-Assembled Nanostructures on 2D Materials Vera Zarubin, MIT
11:55–Noon Photoresist in EBL Alison Dove, UC Berkeley
Noon onwards Discussion time with the presenters in separate meetings All are welcome

Day 2, Fri. Jan 22, 8:50-Noon and on <PDF>

Time Title Speaker
8:50-9 Remarks from Stanford University Mary Tang, Stanford
9-9:20 Transfer and replication of NanoFrazor patterns Samuel Bisig, Heidelberg Nano
9:20-9:40 Engineering custom and relevant cellular microenvironments with maskless photopatterning primo system Matthieu Optiz, Alveole
9:40-10 Multiple Exposure Printing Strategies with Displacement Talbot Lithography for Resolution Enhancement and Generation of Different Pattern Symmetries Li Wang, Eulitha
10-10:10 Coffee Break All
10:10-10:30 Nanofabrication for quantum computing Michael Kahl, Raith Gmbh
10:30–10:50 Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part II) Jan Klein, Micro Resist Technology
10:50–11 Coffee Break All
11-11:20 3D Microfabrication and the Importance of Dedicated Resins Benjamin Richter, Nanoscribe Gmbh
11:20-11:40 Tips and Tricks from our Process Applications Lab (PAL) Niels Wijnaendts van Resandt, Heidelberg Instruments
11:40-Noon Automated Feature Measurements from SEM Images with ProSEM

 

Doc Dougherty, GenIsys

Noon on Discussion time with presenters in separate meetings All are welcome