The Advanced Lithography UnSymposium, 2021
8:50 am - noon, PST
Jan. 21/22, 2021
Agenda
Main content start
| Time | Title | Speaker |
|---|---|---|
| 8:50-9 | Welcome and intro | Mary Tang, Stanford |
| 9-9:20 | Two-photon grayscale lithography | Michael Higdon, Nanoscribe Gmbh |
| 9:20-9:40 | Universal Ion Sources for FIB nanopatterning on a lithography platform | Torsten Richter, Raith Gmbh |
| 9:40-10 | The MLS300: Making a case for a Maskless Stepper Alternative | Sven Preuss, Heidelberg Instruments |
| 10-10:05 | Effect of Developer Temperature on Resist Contrast | Dale Farnan, UPenn |
| 10:05–10:15 | Coffee Break | All |
| 10:15-10:35 | Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part I) | Anja Voigt, Micro Resist Technology |
| 10:35–10:55 | Patterning for Photonics with Displacement Talbot Lithography | Harun Solak, Eulitha |
| 10:55– 11 | Piece Work on the PAS 5500 | Garry Bordonaro, Cornell Nanofabrication Facility |
| 11– 11:10 | Coffee Break | All |
| 11:10- 11:30 | NanoFrazor thermal scanning probe lithography | Nils Goedecke, Heidelberg Nano |
| 11:30- 11:50 | Electron Beam Lithography Software for Enabling Quantum Devices | Roger McCay, GenIsys |
| 11:50– 11:55 | Ion Beam Patterning for Self-Assembled Nanostructures on 2D Materials | Vera Zarubin, MIT |
| 11:55–Noon | Photoresist in EBL | Alison Dove, UC Berkeley |
| Noon onwards | Discussion time with the presenters in separate meetings | All are welcome |
| Time | Title | Speaker |
|---|---|---|
| 8:50-9 | Remarks from Stanford University | Mary Tang, Stanford |
| 9-9:20 | Transfer and replication of NanoFrazor patterns | Samuel Bisig, Heidelberg Nano |
| 9:20-9:40 | Engineering custom and relevant cellular microenvironments with maskless photopatterning primo system | Matthieu Optiz, Alveole |
| 9:40-10 | Multiple Exposure Printing Strategies with Displacement Talbot Lithography for Resolution Enhancement and Generation of Different Pattern Symmetries | Li Wang, Eulitha |
| 10-10:10 | Coffee Break | All |
| 10:10-10:30 | Nanofabrication for quantum computing | Michael Kahl, Raith Gmbh |
| 10:30–10:50 | Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part II) | Jan Klein, Micro Resist Technology |
| 10:50–11 | Coffee Break | All |
| 11-11:20 | 3D Microfabrication and the Importance of Dedicated Resins | Benjamin Richter, Nanoscribe Gmbh |
| 11:20-11:40 | Tips and Tricks from our Process Applications Lab (PAL) | Niels Wijnaendts van Resandt, Heidelberg Instruments |
| 11:40-Noon | Automated Feature Measurements from SEM Images with ProSEM
|
Doc Dougherty, GenIsys |
| Noon on | Discussion time with presenters in separate meetings | All are welcome |