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Diffractive Optical Lens made on the Raith Voyager
NNCI and nano@stanford present:

The Advanced Lithography UnSymposium, 2021

8:50 am - noon, PST
Jan. 21/22, 2021

Agenda

Main content start

Day 1, Thur. Jan 11, 8:50AM-Noon and on PDF

TimeTitleSpeaker
8:50-9Welcome and introMary Tang, Stanford
9-9:20Two-photon grayscale lithographyMichael Higdon, Nanoscribe Gmbh
9:20-9:40Universal Ion Sources for FIB nanopatterning on a lithography platformTorsten Richter, Raith Gmbh
9:40-10The MLS300: Making a case for a Maskless Stepper AlternativeSven Preuss, Heidelberg Instruments
10-10:05Effect of Developer Temperature on Resist ContrastDale Farnan, UPenn
10:05–10:15Coffee BreakAll
10:15-10:35Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part I)Anja Voigt, Micro Resist Technology
10:35–10:55Patterning for Photonics with Displacement Talbot LithographyHarun Solak, Eulitha
10:55– 11Piece Work on the PAS 5500Garry Bordonaro, Cornell Nanofabrication Facility
11– 11:10Coffee BreakAll
11:10- 11:30NanoFrazor thermal scanning probe lithographyNils Goedecke, Heidelberg Nano
11:30- 11:50Electron Beam Lithography Software for Enabling Quantum DevicesRoger McCay, GenIsys
11:50– 11:55Ion Beam Patterning for Self-Assembled Nanostructures on 2D MaterialsVera Zarubin, MIT
11:55–NoonPhotoresist in EBLAlison Dove, UC Berkeley
Noon onwardsDiscussion time with the presenters in separate meetingsAll are welcome

Day 2, Fri. Jan 22, 8:50AM-Noon and on PDF

TimeTitleSpeaker
8:50-9Remarks from Stanford UniversityMary Tang, Stanford
9-9:20Transfer and replication of NanoFrazor patternsSamuel Bisig, Heidelberg Nano
9:20-9:40Engineering custom and relevant cellular microenvironments with maskless photopatterning primo systemMatthieu Optiz, Alveole
9:40-10Multiple Exposure Printing Strategies with Displacement Talbot Lithography for Resolution Enhancement and Generation of Different Pattern SymmetriesLi Wang, Eulitha
10-10:10Coffee BreakAll
10:10-10:30Nanofabrication for quantum computingMichael Kahl, Raith Gmbh
10:30–10:50Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part II)Jan Klein, Micro Resist Technology
10:50–11Coffee BreakAll
11-11:203D Microfabrication and the Importance of Dedicated ResinsBenjamin Richter, Nanoscribe Gmbh
11:20-11:40Tips and Tricks from our Process Applications Lab (PAL)Niels Wijnaendts van Resandt, Heidelberg Instruments
11:40-Noon

Automated Feature Measurements from SEM Images with ProSEM

 

Doc Dougherty, GenIsys
Noon onDiscussion time with presenters in separate meetingsAll are welcome