Advanced Lithography UnSymposium 2021
Each summer, Raith and Heidelberg team with nano@stanford/NNCI to produce the ever-popular Advanced Lithography/Direct-Write Symposia, featuring equipment available across the NNCI facilities. Over 500 researchers have attended since the series began in 2016. Circumstances make this year's event a virtual one. But without constraints of time and space, we have the opportunity to create a different kind of learning and networking experience, an UnSymposium.
This event is over, but you can still learn about our speakers and see some of the presentation slides (go to the "Agenda.") And check back again at this site to ran about future workshops and symposia!
Available presentations are linked from the Agenda page.
The UnSymposium took place over the course of two mornings, with 20 minute presentations interspersed with Lightning talks and breakout sessions.
Our UnSymposium Partners
This events would not be possible without our Partners. In fact, a lot of fabrication would not be possible without them, as they provide, build, and support for some of our most advanced and highly capable tools across the Network and well beyond. Meet our partners and see where you can access their tools in our NNCI facilities.
Our speakers are technologists with decades of applications experience, shaping -- and even creating -- the lithography systems and products we use.
As service providers, our aim is to deliver the latest capabilities to our researchers -- and the know-how to use them. So, nano@stanford and NNCI have hosted a variety of technical workshops, conferences, and symposia that focus on methods and equipment that make up our research infrastructure, rather than research itself. Here are events that have been hosted or co-hosted by nano@stanford under the NNCI.
|8:50-9||Welcome and intro||Mary Tang, Stanford|
|9-9:20||Two-photon grayscale lithography||Michael Higdon, Nanoscribe Gmbh|
|9:20-9:40||Universal Ion Sources for FIB nanopatterning on a lithography platform||Torsten Richter, Raith Gmbh|
|9:40-10||The MLS300: Making a case for a Maskless Stepper Alternative||Sven Preuss, Heidelberg Instruments|
|10-10:05||Effect of Developer Temperature on Resist Contrast||Dale Farnan, UPenn|
|10:15-10:35||Highlights in Resist & Photopolymer Development for advanced micro & nano patterning technologies (Part I)||Anja Voigt, Micro Resist Technology|
|10:35–10:55||Patterning for Photonics with Displacement Talbot Lithography||Harun Solak, Eulitha|
|10:55– 11||Piece Work on the PAS 5500||Garry Bordonaro, Cornell Nanofabrication Facility|
|11– 11:10||Coffee Break||All|
|11:10- 11:30||NanoFrazor thermal scanning probe lithography||Nils Goedecke, Heidelberg Nano|
|11:30- 11:50||Electron Beam Lithography Software for Enabling Quantum Devices||Roger McCay, GenIsys|
|11:50– 11:55||Ion Beam Patterning for Self-Assembled Nanostructures on 2D Materials||Vera Zarubin, MIT|
|11:55–Noon||Photoresist in EBL||Alison Dove, UC Berkeley|
|Noon onwards||Discussion time with the presenters in separate meetings||All are welcome|